Replacing 4,000,000 CPU core-hour optical proximity correction (OPC) with continuous physics-informed Fourier Neural Operators. Synthesizing full-chip curvilinear photomasks in minutes with sub-atomic edge-placement precision.
Simulate 13.5nm wavelength optical proximity correction and neural curvilinear mask generation in real-time. Toggle scanner numerical apertures and source illumination modes below.
At sub-2nm nodes, light does not travel in straight lines. Severe optical diffraction, multi-layer phase shifts, and 3D mask electromagnetic scattering require solving non-linear wave equations across billions of silicon features.
Transforms classical finite-difference time-domain (FDTD) wave solvers into spectral neural operators. Learns mappings directly between arbitrary 3D mask topologies and near-field electromagnetic diffractions in sub-millisecond tensor passes.
Deprecates rectilinear 90-degree polygon slicing. Employs continuous level-set neural implicit surfaces to synthesize organic curvilinear photomasks that maximize process windows and wafer exposure latitude by over 38%.
Predicts quantum photon shot noise and stochastic photoresist dissolution micro-failures before cleanroom exposure. Trained on 14,000,000 experimental critical-dimension scanning electron microscopy (CD-SEM) images.
Side-by-side benchmark conducted on a 68-layer 2nm GAAFET full-chip tapeout vehicle comparing legacy CPU EDA clusters against LithoCore AI's distributed tensor architecture.
| Benchmark Metric | Legacy CPU-Based OPC Tool | LithoCore AI Maxwell-FNO | Advantage |
|---|---|---|---|
| Full-Chip Turnaround Time | 672 hours (28 days) | 4.8 hours (0.2 days) | 140x Faster |
| Compute Cluster Footprint | 4,096 x86 CPU Nodes | 32 Accelerated Tensor Nodes | 99.2% Hardware Reduction |
| Edge Placement Error (EPE) | 0.68 nm | 0.04 nm | 17x Higher Precision |
| Process Window (Exposure Latitude) | 11.4% | 18.9% | +65.7% Margin |
| Stochastic Mask Defects (Defects/cm²) | 0.142 | 0.008 | 94.3% Defect Elimination |
| Energy Consumption per Mask Set | 1,820 MWh | 39 MWh | 97.8% Power Saved |
Evaluate compute cluster reduction and engineering cycle acceleration for your fabless product roadmaps.
Semiconductor tapeouts are sovereign trade secrets. LithoCore AI is designed from the ground up for air-gapped cleanroom servers, private foundry clouds, and encrypted OASIS/GDSII pipelines.
Deployable on local bare-metal tensor clusters inside foundry firewalls without external WAN access.
Directly ingests petabyte hierarchical layout streams with zero data loss and automated multi-beam format export.
Meets strict US and international defense electronics certification requirements and semiconductor cleanroom standards.
Direct API telemetry integration with ASML Twinscan EUV scanners, Applied Materials CD-SEM, and KLA inspection tools.
Explore our core algorithmic defensibility, $18.4B market opportunity, compute scaling thesis, and commercial foundry pipeline.
Combining deep nanoscale electromagnetic wave mechanics with frontier high-performance neural operator research.
Founder & Chief Executive Officer
Former Principal Computational Lithography Architect at top Silicon Valley foundry. 14+ years in inverse electromagnetic physics, Fourier neural operators, and sub-5nm tapeout optimization. BS & MS Stanford Nanofabrication.
Chief Technology Officer & Co-Founder
PhD MIT Applied Physics. Leading authority in spectral neural operators for partial differential equations. Authored foundational papers on Maxwell neural field approximations in sub-wavelength optical regimes.
VP of Foundry Engineering
Former Senior Director of Scanner Metrology at major European semiconductor consortium. 20+ years in extreme ultraviolet scanner illumination and multi-beam mask writer calibration.
VP of Product & Foundry Alliances
Ex-Director of EDA Enterprise Product Management. Led deployment of mission-critical synthesis software across tier-1 mobile and automotive chip designers. Harvard MBA, BS EECS UC Berkeley.
Submit your node requirements and process parameters. A mutual non-disclosure agreement (NDA) and secure sandbox access credentials will be delivered directly from the office of CEO Julian Vance.